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ETD-2000III型三靶離子濺射儀

是依據(jù)二極（DC）直流濺射原理設(shè)計(jì)而成的*簡(jiǎn)單、可靠、經(jīng)濟(jì)的鍍膜設(shè)備。本機(jī)特別之處是在一個(gè)真空室內(nèi)安裝了三個(gè)靶，旋轉(zhuǎn)樣品臺(tái)可依次在同一樣品上涂覆三種材料。因此，適用于實(shí)驗(yàn)室各種復(fù)合膜樣品的制備，以及非導(dǎo)體材料實(shí)驗(yàn)電極的制作。

工作時(shí)結(jié)合內(nèi)部自動(dòng)控制電路很容易控制真空室壓強(qiáng)、電離電流及選擇所需的電離氣體，獲得**鍍膜效果。

配有高位定性的飛躍真空泵

The ETD-2000III type three target ion sputtering apparatus is the simplest， reliable and economical coating equipment designed on the basis of DC (DC) sputtering principle. This machine is specially designed to install three targets in a vacuum chamber. The rotating sample stage can be coated with three materials on the same sample in turn. Therefore， it is suitable for the preparation of various composite membrane samples and the fabrication of experimental electrodes for non conductor materials. It is easy to control the vacuum chamber pressure， ionization current and choose the required ionization gas when working in conjunction with the internal automatic control circuit， so as to achieve the best coating effect. High qualitative jump vacuum pump

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